| 摘要 |
PURPOSE:To allow the easy pulling apart of the photomask after tightly adhesion to a resist film and being exposed without peeling the resist film. CONSTITUTION:This photomask is provided with pattern films 13 constituting mask patterns for transfer on one surface of a mask substrate 12 and is constituted by forming a high-polymer material film consisting of 'Teflon R', etc., having the low adhesion to the resist film on the region averting the pattern films 13 on the surface of the mask substrate 12 on which surface the pattern films 13 are disposed. |
