| 摘要 |
PURPOSE:To provide a projection aligner with which the discrepancy between the pattern and the resist on a semiconductor wafer can be corrected. CONSTITUTION:Only the resist region, which requires the correction of the discrepancy between a pattern 1 and a resist 2, is heated up and the resist 2 is refludized. Accordingly, a heating device, with which a laser beam can be made to irradiate (3) in a spot-like manner, is incorporated into a projection aligner. The discrepancy between the pattern and the resist can be corrected by refludizing the resist. |
