发明名称 DEVELOPING SOLUTION FOR PHOTORESIST
摘要 PURPOSE:To obtain better resolution and eliminate foaming by mixing a specified surface active agent with alkaline water solution. CONSTITUTION:A compound indicated by the equation I is mixed by an amount of 50 to 5000ppm with alkaline solution. In the equation, R is an alkyl group with the number of carbons of 4 to 18 or a phenyl group which may be substituted with an alkyl group with the number of carbons of 1 to 13, X is a group indicated by -CH2-CH2-O-, Y is a group indicated by -CH(CH3)-CH2-O-, m is an integer of 5 to 40, n is an integer of 2 to 30, and m:n is 40:60 to 75:25. As the alkaline solution, water solutions of alkaline metal hydroxide such as sodium hydroxide, potassium hydroxide, etc., those of amines, etc., such as propyl amine, butyl amine, di-n-butyl amine, triethylamine, etc.
申请公布号 JPH04346351(A) 申请公布日期 1992.12.02
申请号 JP19910118914 申请日期 1991.05.23
申请人 TOKUYAMA SODA CO LTD 发明人 NONAKA TORU;OMI TADAHIRO;BABA HIDEJI
分类号 G03F7/32;H01L21/027;H01L21/30 主分类号 G03F7/32
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