MASK FOR X-RAY EXPOSURE AND MANUFACTURE THEREOF

摘要

PURPOSE:To obtain a reflection-type X-ray mask with a high reflection factor and a reduced exposure time by eliminating a problem of reduction in reflection factor due to roughening on a reflecting surface of a multilayer film by a conventional method for manufacturing a reflection-type X-ray mask. CONSTITUTION:A focusing energy beam is emitted to a multilayer film 2 of a space portion of a mask pattern, thus machining to a state where no X-rays are reflected, in a reflection-type mask for X-ray exposure.