| 摘要 |
PURPOSE:To enable pattern transfer to a photosensitive resin film with a mask by single mask positioning and exposure in spite of difference in proper exposure between pattern regions. CONSTITUTION:When a light shielding film 4 with a drawn gate pattern 15 is formed on one side of a glass substrate 3 to obtain a mask, a pattern of a light absorbing film 16 is formed on the other side of the substrate 3 so as to cover only the gate finger pattern 15a of the gate pattern 15. |
