发明名称 PRODUCTION OF RESIN MOLDING HAVING HEAT RESISTANCE AND IMPACT RESISTANCE
摘要 PURPOSE:To produce a resin molding having improved impact resistance while maintaining characteristic heat resistance by irradiating an aromatic polyether- based copolymer molding with a given dose of radiation. CONSTITUTION:A molding composed of an aromatic polyether-based copolymer obtained by subjecting a compound shown by formula I, a compound shown by formula II (X is halogen) and a compound shown by formula III (n is 1 or 2) to polycondensation through desalting, comprising a reaping unit shown by formula IV and one shown by formula V in ratio of the unit shown by formula IV (group shown by formula IV/formula IV + formula V) of 0.1-0.5 in mol base, preferably having >=3,000 poise melt viscosity at 400 deg.C and 130-250 deg.C glass transition temperature is irradiated with 10<5>-10<7> gray dose of radiation (e.g. X-ray or accelerated electron ray) in air, in vacuum or in an inert gas at room temperature - 250 deg.C to produce a resin molding having excellent heat resistance and impact resistance, comprising the aromatic polyether- based copolymer.
申请公布号 JPH04342739(A) 申请公布日期 1992.11.30
申请号 JP19910116296 申请日期 1991.05.21
申请人 IDEMITSU KOSAN CO LTD 发明人 MURAKAMI SHIGERU;MATSUO SHIGERU
分类号 C08G65/40;B29C35/08;B29C71/04;C08F283/00;C08J3/28;C08J7/00 主分类号 C08G65/40
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