| 摘要 |
A device of the central reactor type is disclosed for processing and cleaning wafers, such as flat parts (11) of regular geometric shape such as, for example, semiconductor carriers used in manufacturing integrated circuits, or optical discs, etc. Said device comprises a chamber (28) having sidewalls, an end wall (9), an opening in a front face (8) opposite the said end wall, a support means for carrying several parts (11), a means (15) for feeding processing fluid, a means (6) for closing the said chamber (28), a means (14) for discharging the said fluids arranged so that the said parts can be processed by these fluids and the chamber then drained. The said support means for the parts (11) is rigidly secured to the closing means (6) and comprises two lateral combs (1) pivotably mounted on links (16, 17) which move away from each other when swivelled to allow the said parts (11) to pass between the combs, and then move towards each other so that they rest upon said parts and hold them in the chamber.
|
