| 摘要 |
PURPOSE:To provide the new device structure formed by integrating an optical waveguide and an optical branching/coupling element, and also, to obtain excellent reliability and reproducibility by patterning and etching simultaneously the optical waveguide and the optical branching/coupling element part. CONSTITUTION:By pre-etching a coupler 105 area in advance, the whole wafer can be smoothed at the time of applying a resist, therefore, a single photomask alignment is sufficient and also, rib type waveguides 102-104 and a wave front split type coupler 105 can be manufacture by a single fine working. Thus, the improvement of yield, the realization of a large area and the improvement of device accuracy can be expected. |
