| 摘要 |
<p>PURPOSE:To improve the contrast of the optical exposing mask and to simplify the sage for forming phase shifters without generating the abnormality of patterns at the ends of the phase shifters. CONSTITUTION:The patterned phase shifters 5A are provided on a glass substrate 1. Since the ends of the phase shifters 5A are inclined, the phases thereof change gradually from 80 deg. to 0 deg. from the parts there the phase shifters exist to the parts where the phase shifters do not exist and, therefore, the light intensity decreases drastically in the boundary parts thereof and the generation of the remaining of a positive resist or the drop-out of the negative resist is obviated.</p> |
