发明名称 MULTILAYER INTERCONNECTION STRUCTURE
摘要 PURPOSE:To simplify a processing work for coupling both interconnection layers by burying a solder ball in a viahole formed in a multilayer interconnection structure having interconnection layers on both side surfaces of an insulating layer. CONSTITUTION:After a viahole 1 is opened by a mold pressing opening method in a state that an interconnection layer 4 is provided on an insulating layer 5, an interconnection layer 7 of a copper foil is adhered on a lower surface through an epoxy series adhesive layer 6. A solder ball 8 is buried in the viahole 1 thereby to couple both the layers 4, 7. As a method for burying the ball, an end of an interconnection passed through the hole of a capillary 10 is melted by an arc discharge in an (Ar+H2) atmosphere from a line 14 to form a ball 12, and connected by a thermal press-bonding method together with an ultrasonic wave. Thus, a multilayer interconnection structure can be efficiently manufactured.
申请公布号 JPH04337695(A) 申请公布日期 1992.11.25
申请号 JP19910110309 申请日期 1991.05.15
申请人 HITACHI CABLE LTD 发明人 ONDA MAMORU;TAKAGI MASAHARU
分类号 H05K3/40;H05K3/46 主分类号 H05K3/40
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