| 摘要 |
PURPOSE:To obtain superior characteristics on the whole, by forming a photoconductive amorphous silicon layer consisting of 2 layers on a substrate, and using a material contg. 40mol% silicon and 60mol% carbon for the second layer. CONSTITUTION:An amorphous material layer 102 contg. silicon atoms as a main component, and at least one of hydrogen and halogen as an element is formed on a substrate 101 to fabricate a photoconductive material 100. The layer 102 consists of the first photoconductive layer 103 and the second layer 104 contg. silicon atoms, and carbon atom up to 60 atomic % as constituent elements of amorphous materials, thus permitting the obtained photoconductive material to be enhanced in comprehensive characteristics of electrical, optical, and photoconductive characteristics, durability, etc. |
