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发明名称
SPUTTER DEPOSITION APPARATUS
摘要
申请公布号
JPH04329875(A)
申请公布日期
1992.11.18
申请号
JP19910098523
申请日期
1991.04.30
申请人
HITACHI LTD
发明人
SETOYAMA HIDETSUGU;KAMEI MITSUHIRO
分类号
C23C14/35
主分类号
C23C14/35
代理机构
代理人
主权项
地址
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