发明名称 DEVICE FOR CONTINUOUS FUSED SALT ELECTROLYTIC PLATING
摘要 <p>PURPOSE:To stably execute a plating treatment without requiring a large amt. of inert gas in a fused salt electrolytic plating cell by providing inert gas rail chambers before and behind the plating cell at the time of plating a metal on the surface of steel products by a fused salt electrolytic plating method. CONSTITUTION:The steel product 22 un-wound from a payoff reel 21 is welded to the succeeding end of the preceding steel product by a welding machine 23 and is then sent via a looper 24 to a pretreating device 25 where the steel product is subjected to pretreatments, such as defatting, pickling and preheating. The steel product then enters a fused salt electrolytic plating bath 31 in the plating cell 26, where the steel product is energized with an anode column 12 and the metal such as Al, is plated on the surface of the steel product 22 as a cathode by the fused salt electrolytic plating method. This steel product is subjected to a post treating device 27 for washing, drying, etc., a looper 28 and a cutter 29 and is taken up on a tension reel 30. The sealing chambers 33, 34 maintained with the inert gaseous nitrogen likewise at a positive pressure are provided before and behind the plating cell 26 of the inert gaseous atmosphere of nitrogen, etc., by which the inside of the plating cell 26 is maintained always at the inert atmosphere by the nitrogen with the consumption of just a small amt. of the gaseous nitrogen.</p>
申请公布号 JPH04329898(A) 申请公布日期 1992.11.18
申请号 JP19910101507 申请日期 1991.05.07
申请人 SUMITOMO METAL IND LTD;MITSUBISHI HEAVY IND LTD 发明人 YAMAMOTO YASUHIRO;TSUDA TETSUAKI;UCHIDA JUNICHI;SETO HIROHISA;FUKUI KUNIHIRO;ABE MASARU;YONEDA JUNKICHI;HASHIMOTO RITSUO;TAGUCHI TOSHIO
分类号 C25D3/06;C25D3/66;C25D5/26;C25D7/06;C25D17/00 主分类号 C25D3/06
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