MANUFACTURE OF SILICON OXIDE FILM FOR SEMICONDUCTOR DEVICE,申请号JP19910194713-传众专利搜索

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发明名称	MANUFACTURE OF SILICON OXIDE FILM FOR SEMICONDUCTOR DEVICE
摘要
申请公布号	JPH04329639(A)	申请公布日期	1992.11.18
申请号	JP19910194713	申请日期	1991.05.01
申请人	KOJUNDO CHEM LAB CO LTD	发明人	MICHIDO YUUKOU;FUTAKI TAKEHIKO
分类号	H01L21/316	主分类号	H01L21/316
代理机构		代理人
主权项
地址

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