| 摘要 |
PURPOSE: To prevent the generation of residue due to a shift of a focus at the time of exposure by incorporating specified 1,2-quinonediazidosulfonic ester and a specified compd. CONSTITUTION: A layer is formed by coating with a radiation sensitive resin compsn. contg. 1,2-quinonediazidosulfonic ester of a resin having phenolic hydroxyl groups and contg. <=12wt.% low mol.wt. component having a mol.wt. of <=600 (expressed in terms of polystyrene) and a compd. selected from among an org. acid, its salt, its halogenide and a compd. generating an acid when irradiated. Only a selected part of the layer is irradiated, the layer is treated with a silylating agent and this agent is selectively absorbed in the irradiated part and allowed to react. The layer is then dry-developed by anisotropic oxygen plasma etching to selectively remove the unirradiated part of the layer. Thereby a low mol.wt. component in the resin is reduced. |
