X-RAY LITHOGRAPHY MASK

摘要

The X-ray lithography mask for preventing the distortion phenomena of pattern comprises a frame (21) for protecting and maintaining the transparent substrate (22); a transparent substrate having a high transmittance on X-ray; a X-ray absorption layer formed on the transparent substrate in a stripe form; a stress buffer layer for burying the X-ray absorption layer. The frame material is silicon or glass of ring-form for dimensional stability. The SiC or SiNx having a similar heat expansion with the frame material is used as the transparant substrate. The X-ray absorption layer acting as the mask pattern is composed of metal substances of 0.5 μm thickness.