MAGAZINE FOR HOLDING DISK-SHAPED WORKPIECE, ESPECIALLY SEMICONDUCTOR WAFER, WHEN IT UNDERGOES WET SURFACE TREATMENT IN LIQUID BATH

摘要

PURPOSE: To reduce degradation in the form and dimension of wafer by forming a work from a material having resistance work respect to a liquid phase using housing and insert. CONSTITUTION: This magazine is composed of a cylindrical housing 1 equipped with a hole 2 for liquid passage, closed lid 3 and core rod 4 on the side of end face and an insert 5 for holding a wafer 6, while confronting planarly vertically and tightly, adjacent to the cylindrical axial line of housing 1 almost inside the housing 1. The insert 5 is composed of a guide strut 7 and a seat strut 8 and arranged on a cylindrical cover at equal distance from the cylindrical axial line of housing 1. It is preferable that the diameter of the housing 1 be made 1.1-1.9 times that of a wafer 6. It is preferable that the material of insert 5 and housing 1 have resistance with respect to a cleaning agent and an etching agent and has no polluting effects for the wafer 6 to be used. Thus, degradation in the shape and dimension of the wafer 6 can be reduced.