SULFURIC ACID COMPOSITION HAVING LOW SURFACE TENSION

摘要

PURPOSE:To provide a sulfuric acid compsn. having a low surface tension and being suitable as a sulfuric acid for use in the semiconductor-fabricating step. CONSTITUTION:The title compsn. comprises a fluoroalkylsulfonamide of formula R<1>-SO2-NR<2>-CH2-CHOR<3>-CH2 OR<4> wherein R<1> is a fluoroalkyl group; R<2> is a 1-6C alkyl group; R<3> and R<4> may be the same or different each other and are each a hydrogen atom or a sulfo group and sulfuric acid.