| 摘要 |
PURPOSE:To obtain the subject composition excellent in defoaming properties, stable in conditions of high oxidative atmosphere and high temperature and useful for production of semiconductors by mixing a specified fluoroalkyl sulfonamide in sulfuric acid. CONSTITUTION:An objective composition obtained by adding 0.001-0.1wt.% (preferably 0.005-0.05wt.%) fluoroalkyl sulfonamide compound represented by formula R<1>-SO2-NR<2>-CH2-(CHOR<3>)n-CH2OR<3> (R<1> is fluoroalkyl; R<2> is phenyl, benzyl or phenethyl; R' is H or -O2SOH; n is 0 or 1) to sulfuric acid. In addition, as the fluoroalkyl sulfonamide and sulfuric acid, respectively high-purity substances are used. |
