| 摘要 |
PURPOSE:To execute uniform development in a short period of time. CONSTITUTION:A substrate 1 and a developer 11 are controlled in temp. and the part where the film 2 to be developed is required to be removed is dissolved by the developer 1 thereafter, the dissolved matter is removed by passing the developer 25 to the film 2 to be developed and further the developer and dissolved matter are completely removed by passing a rinsing liquid 26 to the film 2 to be developed. The force and complete removal of the dissolved matter of the film to be developed is executed by dissolving the film 1 to be developed at a relatively high temp., then passing the developer 25 to the film 1 to be developed and further the rinsing liquid 26 thereto and, therefore, the developing time is shortened and the developed state uniform over the entire part is obtd. |
