METHOD AND DEVICE FOR CALIBRATING AN OPTICAL PYROMETER, AND ASSOCIATED REFERENCE WAFERS

摘要

The method involves detecting at an instant t a discontinuity in reflection from a layer of active material having reflection discontinuity at a known temperature in order to determine the temperature which should be shown by a temperature measuring means (pyrometer (14)) at this instant t. The device according to the invention sends an electromagnetic wave (11) to the active material and senses (12), measures and analyses (32, 31, 33) the intensity of radiation reflected by this material in order to determine the discontinuity involved. The reference wafers (18) advantageously consist of a thin layer of active material deposited on a thin separating layer, itself deposited on a thin layer substrate. The active material layer is additionally covered by a protective layer. A pyrometer (14) used in ovens (15) for rapid heat treatment of semiconductor wafers (18) can be calibrated in this way.