发明名称 STACK GAS CLEANING PROCESS
摘要 <p>A gas cleaning process for treating a gas stream which contains dioxin forming components including hydrogen chloride. The process comprising selectively removing the hydrogen chloride, by using for example sodium β aluminate, at a temperature above that at which chlorinated dioxins are formed thereby preventing their formation. The conventional problem of the disposal of dioxin contaminated material is thus reduced.</p>
申请公布号 WO1992019365(A1) 申请公布日期 1992.11.12
申请号 GB1992000723 申请日期 1992.04.21
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