A pattern development system.

摘要

A pattern development system (46) for use during the garment development process includes a digitizer (48) with a work surface (56). The designer draws the lines (36) of a garment pattern segment (38) on a sheet (54) placed on the work surface with a stylus (50) that enables the digitizer to present position signals to a controller (58) in real time. The controller includes algorithms to compose the drawn lines into a garment segment pattern as well as compensate for human errors such as multiply drawn lines and missing line portions. The present system is transparent to the designer in operation as it adapts to the human designer rather than forcing the designer to adapt to the system. <IMAGE>