| 摘要 |
PURPOSE:To obtain an electrode not becoming inoperative even under high temperature and high moisture by forming a Ti-Pd alloy or Ti-V alloy layer and noble metal layer defined in composition and thickness on an electrode wiring metallic layer when using material containing aluminum as main ingredient for the metallic layer. CONSTITUTION:An SiO2 film 16 is covered on an Si substrate 11, a window is opened thereat, an aluminum layer 12 is extended on the film 16 to contact with the substrate 11, an SiO2 film 17 is covered on the entire surface, a window is again opened while being disposed on the layer 12, and a prescribed electrode is mounted on the layer 12. Ti-Pd alloy containing 0.01-5% of Pd or Ti-V alloy containing 0.01-10% of V is employed for the metallic material covered on the exposed layer 12 in this configuration, and the thickness is specified to 1,000-3,000Angstrom . Further, an Au layer 15 is formed through a Pt layer 14 thereon as a laminated electrode structure. Thus, the reliability of the device cannot be lowered even if it is allowed to stand at approx. 80 deg.C and approx. 90% of humidity for. |
