发明名称 MULTILAYERED WIRING STRUCTURE, AND MANUFACTURE THEREOF
摘要 PURPOSE:To provide a simpler method of manufacturing a multilayered high- density wiring structure which has wiring layers strong enough to prevent breaks and prevents short circuits between adjacent layers, and also which can be repaired even if wiring layers include discontinuities or poor connections. CONSTITUTION:A multilayered wiring structure includes a wiring substrate 1, a first wiring layer 2 formed on the substrate 1, a second wiring layer 3 in the form of an air bridge above the first wiring layer 2, an insulating film 4 under the second wiring layer 3, and a metallic layer 5 formed over the surface except under the second wiring layer.
申请公布号 JPH04320049(A) 申请公布日期 1992.11.10
申请号 JP19910112262 申请日期 1991.04.18
申请人 FUJITSU LTD 发明人 ITO HIROSHI;KOSUGI MASATO
分类号 H01L23/522;H01L21/768;H01L27/00;H05K3/46 主分类号 H01L23/522
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