发明名称 LITHOGRAPHY APPARATUS
摘要 PURPOSE: To obtain the lithography device with structure which is compact in a Z-direction by using a carrier suspended from a fitting member and then fitting the fitting member to a lower frame support, and forming frame structure which allows a positioning device and the support member to be arranged between lower frame supports. CONSTITUTION: The lithography device is equipped with a lithography light emitting device 1 which has a main perpendicular optical axis 3 parallel to the Z-direction and is fitted to the fitting member 5, belonging to the frame of the device nearby below the main optical axis and the positioning device 37 which is arranged below the light-emitting device 1, and an object table 21 is made movable to and from the light-emitting device 1 over the guide surface 33 which is orthogonal to the Z-direction of the support member 35 connected to the positioning device 37. Then the positioning device 37 and support member 35 are positioned on a carrier 67, suspended as a unit 65 from the fitting member 5.
申请公布号 JPH04319956(A) 申请公布日期 1992.11.10
申请号 JP19920020147 申请日期 1992.02.05
申请人 A S M RISOGURAFUI BV;PHILIPS GLOEILAMPENFAB:NV 发明人 DOMINIKUSU YAKOBUSU FURANKEN;FURANSHISUKASU MASEISU YAKOBUSU;YOHANESU MASEISU MARIA FUAN KIMENADE;KORUNERISU DEIONISHIASU FUAN DEEIKU;YAN FUAN EIKU
分类号 F16F15/02;F16F15/023;F16F15/04;G03F7/20;G03F9/00;H01L21/027;H01L21/30 主分类号 F16F15/02
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