发明名称 MANUFACTURE OF X-RAY MASK
摘要 <p>PURPOSE:To provide a manufacturing method which can control the tension of a membrane freely when the membrane for an X-ray mask is formed so as to, for instance, give a tensile tension to the membrane showing a compression tension at the time of film forming or relieve the tension of the membrane showing a high tensile tension at the time of film forming. CONSTITUTION:A rear membrane 2b is formed on the rear of a substrate and then a surface membrane 2a is formed. After that, the rear membrane 2b is etched.</p>
申请公布号 JPH04314322(A) 申请公布日期 1992.11.05
申请号 JP19910079599 申请日期 1991.04.12
申请人 MITSUBISHI ELECTRIC CORP 发明人 YABE HIDETAKA;YOSHIOKA NOBUYUKI
分类号 G03F1/22;H01L21/027;H01L21/30 主分类号 G03F1/22
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