| 摘要 |
<p>PURPOSE:To obtain a photomask which enables formation of an accurate pattern. CONSTITUTION:A light shielding film 3 which shields light is formed on one main surface of a glass substrate 1 which transmits light. A shifter film 5 which inverses the phase of light is formed in contact with the glass substrate 1 which transmits light in a manner that the shifter film 5 is disposed on one side of the light shielding film 3. A damping film 6 which damps intensity of light is formed adjacent to the glass substrate 1 in a manner that the damping film 6 is under the light shielding film 3.</p> |
