METHOD FOR MONITORING LATENT IMAGE IN PHOTORESIST

摘要

PURPOSE: To accurately monitor a latent image, including the latent image with submicron order in a photoresist by allowing the latent image in the photoresist to apply a pulse beam from a monochromatic light source into a resist layer region being exposed and selectively detecting diffracted light. CONSTITUTION: A device has a pulse laser 100 for generating a coherent pulse beam and an adjustable laser mount for guiding the pulse beam to a resist layer 110 in a specific region 111 which includes a latent image 112. The resist layer 110 is arranged on a substrate 120 such as a semiconductor wafer, and the latent image 112 is formed by exposing ultraviolet rays from a light source 130 onto a resist, via a collimator lens 135 and a projection mask 140. A detector 150A receives reflected light from the region 111, and a detector 150B receives light diffracted from the region 111.