发明名称 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
摘要 <p>PURPOSE:To suppress a growth of an alloy layer accompanied by a plating process of an external lead in a semiconductor device having the external lead and to prevent it from generating inconveniences such as breaking of the external lead, an increase in an electric resistance, or the like. CONSTITUTION:A nickel plating layer 16 is solely formed on a copper foil 10, or the nickel plating layer 16 and a copper plating layer 18 are doubly formed and then a solder plating layer 12 is formed thereon. Further, a palladium plating layer is formed instead of the nickel plating layer 16.</p>
申请公布号 JPH04312937(A) 申请公布日期 1992.11.04
申请号 JP19910060653 申请日期 1991.03.26
申请人 MITSUBISHI ELECTRIC CORP 发明人 HIEDA SAONORI;OGAWA YOSHIFUSA
分类号 H01L21/60;H05K3/24;H05K3/34 主分类号 H01L21/60
代理机构 代理人
主权项
地址