| 摘要 |
PURPOSE:To manufacture a liquid jet recording head which is highly accurate and has adequate strength using lithography technique and solve an issue of residual developer by using a water soluble regist in a part which corresponds to an ink liquid flow path. CONSTITUTION:An ink discharge energy generation element 2 is provided on a substrate 1, and a water soluble positive resist layer 3 which is sensitive to ionized radiation is formed on the element 2. Further, this layer 3 is exposed to light for the formation of an kink liquid flow path. Next, the layer 3 is developed to form a dissoluble resin pattern consisting of parts 5, 6 corresponding to the ink liquid flow path on the substrate. In addition, a coated resin layer 7 is provided on the pattern and then a glass top plate 10 with an ink supply orifice 8 is junctioned to the layer 7. After this process, the positive resist layer 3 is exposed to light for the formation of an ink liquid chamber through a mask 11, and is developed to dissolve and remove a part corresponding to the resin patterns 5, 6 and the ink liquid chamber 9 for a complete liquid jet recording head. |
