Scanning electron microscope based parametric testing method and apparatus
摘要
A scanning electron microscope (28) is connected to a test structure (48) formed on a semiconductor wafer. The test structure (48) comprises a plurality of first parallel structures (54) and a plurality of second parallel structure (56) transverse to and interlocking with the first structures (54). An island (60) is formed within a grid (58) formed by the structures (54-56) and is separated therefrom. An electron beam (38) from the scanning electron microscope (28) is aimed at the structure (48) and secondary electrons emitted therefrom are visually displayed on a monitor (44). The visual display (47) provides information on whether the island (60) is electrically separated from the mesh (58) or shorted thereto by comparing the intensity of the various islands (60).
申请公布号
US5159752(A)
申请公布日期
1992.11.03
申请号
US19900595920
申请日期
1990.11.30
申请人
TEXAS INSTRUMENTS INCORPORATED
发明人
MAHANT-SHETTI, SHIVALING S.;ATON, THOMAS J.;GALE, REBECCA J.