发明名称 ROTARY SUBSTRATE TREATMENT APPARATUS
摘要 PURPOSE:To reduce the labor required when new substrate treatment procedure is formed. CONSTITUTION:When a processing step (heat treatment step) for setting a process parameter (variable parameter) is indicated, a parameter setting screen for urging the setting of all of the process parameters related to the heat treatment step is displayed. When the parameter values of all of process parameters (heat treatment temp., a heat treatment time, heat treatment-related non- treatment time, a heat treatment-related treatment time, substrate temp. promising correction quantity) to be set are inputted by an input key, the data input of the heat treatment step is completed. Thereafter, new substrate treatment procedure for the setting input of the parameter values of process parameters and the reading of an initial parameter is formed with respect to the remaining treatment step in the same way to be stored.
申请公布号 JPH04310266(A) 申请公布日期 1992.11.02
申请号 JP19910101867 申请日期 1991.04.05
申请人 DAINIPPON SCREEN MFG CO LTD 发明人 HIMOTO MASAHIRO;YOKONO KENSHO
分类号 B05C11/08;G03F7/30;H01L21/02;H01L21/027;H01L21/30 主分类号 B05C11/08
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