发明名称 PHOTOMASK
摘要 PURPOSE:To improve pattern transfer accuracy and durability to laser light by laminating a laser light reflecting film on a glass substrate so that adjacent dielectric layers differ in refractive index. CONSTITUTION:The glass substrate 1 which transmits the wavelength of the object laser light is used and, for example, lead glass, etc., is used. On the glass substrate 1, the laser light reflecting film 7 is laminated so that the dielectric layers 7a and 7b which differ in refractive index adjoin to each other. Those dielectric layers 7a and 7b transmit the wavelength of the objective laser light and there is, for example, fluoride. When the refractive indexes n1 and n2 of the dielectric layers 7a and 7b are so determined that n1>n2, the reflected light at the border where the laser light is incident on the dielectric layer 7b from the dielectric layer 7a is in phase with the incident light and when n1<n2, the light is reflected, thereby increasing the reflection effect. Thus, the laser light is reflected and cut off without being absorbed, so pattern deterioration is lessened.
申请公布号 JPH04309952(A) 申请公布日期 1992.11.02
申请号 JP19910103768 申请日期 1991.04.08
申请人 NISSIN ELECTRIC CO LTD 发明人 IDENO SHINICHI
分类号 G03F1/52;G03F1/58;H01L21/027 主分类号 G03F1/52
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