| 摘要 |
PURPOSE: To produce a positive photoresist composition having a good photographic sensitivity, high contrast, good resolving power, heat stability good in picture during treatment, wide latitude for treating and good line width controlling property and clear in developing and low in loss of unexposed film. CONSTITUTION: In a photosensitizer consisting of diazoester of 2,3,4,4'- tetrahydroxy benzophenone, its hydroxide group is esterified with a diazosulfonyl chloride consisting of about 50-100mol.% 2,1,4-diazosulfonyl chloride and 0-about 50mol.% 2,1,5-diazosulfonyl chloride. The composition is composed of the photosensitizer existing in the photoresist composition in a sufficient amount for uniformly photosensitizing and a mixture of a novolac resin insoluble to water and soluble to an alkali aq. soln. and existing in the photoresist composition in a sufficient amount for forming the uniform photoresist composition. |
