| 摘要 |
PURPOSE:To thin film thickness of an immersion liquid and reduce the quantity of light absorbed, and to minimize and prevent exposure unevenness in an adhesion type exposure device. CONSTITUTION:The adhesive surface 11 of an exposure lens is hydrophilic- treated by a hydrophilic solution such as alcohol. A wafer 3 coated with a photoresist 4 is fast stuck on the hydrophilic-treated adhesive surface 11 through an immersion liquid 5, and the pattern 7 of a photomask 1 is transferred onto the wafer 3 by the irradiation of irradiation light 6. Wafer absorbing properties are improved in the hydrophilic-treated adhesive surface 11, and the film thickness of the immersion liquid 5 is made thin. |
