Photoresist compositions comprising styryl compounds.

摘要

A photoresist composition which comprises a compound of the general formula: wherein W and Z are the same or different and an electron attractive group; R10 is an optionally substituted C1-C10 alkylene group, R11 is a hydrogen atom, an optionally substituted C1-C10 alkyl, alkenyl or aralkyl group; and each of R12 and R13 is independently a hydrogen atom, an optionally substituted lower alkyl group, an optionally substituted lower alkoxy group, an amide group or a halogen atom.