Acid-cleavable radiation-sensitive compounds, radiation-sensitive composition containing the same and radiation-sensitive recording material prepared therefrom.

摘要

A radiation-sensitive mixture is described which contains compounds of the general formula I in which R<1> denotes an alkyl, highly fluorinated alkyl, perfluoroalkyl or aryl radical, R<2> denotes a hydrogen atom, an alkyl or aryl radical, one of the groups (R<1>-SO2-O-)nX- or R<3>O-, R<3> and R<4> are identical or different and denote alkyl, cycloalkylalkyl, cycloalkenylalkyl or aralkyl radicals in which 1 to 3 aliphatic CH2 or CH groups can be replaced by NR<5>, O, S, CO, CO-O, CO-NH, O-CO-NH, CO-NH-CO, NH-CO-NH, SO2, SO2-O, SO2-NH; or alkenyl, alkynyl, cycloalkyl or cycloalkenyl radicals or are connected with one another to give a heterocyclic ring, R<5> denotes an acyl radical, X denotes an alkyl, cycloalkyl or aryl group, R<1>-SO2-O-substituted by 1 to 3 sulphonyloxy groups and n denotes an integer from 1 to 3. On irradiation, the compounds form sulphonic acids and can be cleaved by these. In combination with alkali-soluble binders, they give positive-working mixtures which are used, in particular, in recording materials for UV radiation and energy-rich radiation. The materials are distinguished by high resolution in combination with high image contrast and outstanding storability.