Method for fabrication of semiconductor device utilizing ion implantation.

摘要

An improved method for fabrication of a super-high density semiconductor device wherein ion implantation is used to eliminate defects or inhibit the occurrence or growth of defects in the semiconductor device. Ions of high concentration are implanted into a monocrystal semiconductor region in which principal elements such as bipolar element and MOS element are formed, by using a mask pattern covering the semiconductor region and at a largely inclined implantation angle equal to or of more than 20 degrees. This provides for formation of amorphous regions (170A, 170B) extending sufficiently into areas beneath the ends of the mask. The amorphous regions are recrystallized by heat treatment, thereby inhibiting the growth of a corner defect known as "voids 21" which has often occurred at edges of amorphous regions (170A, 170B) in the conventional method. Thus, a device which is less liable to electrical leaks is provided.