发明名称 MANUFACTURE OF WAFER HOLDER
摘要 <p>PURPOSE:To form well shallow recessed portions of depth not more than several tens mum in the wafer mounting face of a wafer holder with good productivity when using dense ceramics as the base of the wafer holder such as an electrostatic chuck. CONSTITUTION:A film electrode 5 is provided on the main surface 1b of a ceramics base 1 in the form of e.g. a disk. A ceramics dielectric layer 6 is provided in such a way as covering the film electrode 5. Recessed portions 8A, 8B are formed in the wafer mounting face 22 of the ceramics dielectric layer 6 by shot blasting. A semiconductor wafer 9 is mounted on the wafer mounting face 22 and attracted thereto.</p>
申请公布号 JPH04304941(A) 申请公布日期 1992.10.28
申请号 JP19910089140 申请日期 1991.03.29
申请人 NGK INSULATORS LTD 发明人 USHIGOE RYUSUKE;NOBORI KAZUHIRO;ARAI YUSUKE
分类号 B23P15/00;B23Q3/15;B24C1/00;H01L21/205;H01L21/68;H01L21/683 主分类号 B23P15/00
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