发明名称 |
MANUFACTURE OF WAFER HOLDER |
摘要 |
<p>PURPOSE:To form well shallow recessed portions of depth not more than several tens mum in the wafer mounting face of a wafer holder with good productivity when using dense ceramics as the base of the wafer holder such as an electrostatic chuck. CONSTITUTION:A film electrode 5 is provided on the main surface 1b of a ceramics base 1 in the form of e.g. a disk. A ceramics dielectric layer 6 is provided in such a way as covering the film electrode 5. Recessed portions 8A, 8B are formed in the wafer mounting face 22 of the ceramics dielectric layer 6 by shot blasting. A semiconductor wafer 9 is mounted on the wafer mounting face 22 and attracted thereto.</p> |
申请公布号 |
JPH04304941(A) |
申请公布日期 |
1992.10.28 |
申请号 |
JP19910089140 |
申请日期 |
1991.03.29 |
申请人 |
NGK INSULATORS LTD |
发明人 |
USHIGOE RYUSUKE;NOBORI KAZUHIRO;ARAI YUSUKE |
分类号 |
B23P15/00;B23Q3/15;B24C1/00;H01L21/205;H01L21/68;H01L21/683 |
主分类号 |
B23P15/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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