发明名称 Method and apparatus for detecting and analyzing defective semiconductor element.
摘要 A method of detecting a defective portion of a semiconductor element, includes the steps of: setting a semiconductor element (100) on a stage (12) of an emission microscope (11); setting a magnification of the emission microscope low and observing a surface of the semiconductor element by the emission microscope while an electric power is supplied to the semiconductor element; storing a positional information of at least one light emission portion of the semiconductor element observed by the emission microscope; moving the stage on the basis of the stored positional information so that one light emission portion is moved to a view center of the emission microscope; increasing the magnification and collecting a light emission image of one light emission portion by the emission microscope; and moving the stage on the basis of the stored positional information so that another light emission portion is moved to the view center so as to collect a light emission image of another light emission portion by the emission microscope.
申请公布号 EP0510887(A2) 申请公布日期 1992.10.28
申请号 EP19920303482 申请日期 1992.04.16
申请人 SHARP KABUSHIKI KAISHA 发明人 IMATAKI, TOMOO;SUZUKI, MAMORU
分类号 G01R31/308 主分类号 G01R31/308
代理机构 代理人
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