| 发明名称 |
alpha -diazoacetoacetates and photosensitive resin compositions containing the same |
| 摘要 |
An alpha -diazoacetoacetic acid ester derived from cholic acid, deoxycholic acid, lithocholic acid or a derivative thereof is effective as a sensitizer in a photosensitive resin composition containing an alkali-soluble resin to form a resist for lithography using KrF excimer laser.
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| 申请公布号 |
US5158855(A) |
申请公布日期 |
1992.10.27 |
| 申请号 |
US19880247882 |
申请日期 |
1988.09.22 |
| 申请人 |
HITACHI, LTD. |
发明人 |
SUGIYAMA, HISASHI;NATE, KAZUO;MIZUSHIMA, AKIKO;EBATA, KEISUKE |
| 分类号 |
G03F7/016;(IPC1-7):G03F7/023;G03F7/075;G03F7/36 |
主分类号 |
G03F7/016 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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