发明名称 |
ROTARY SPUTTERING CATHODE |
摘要 |
A vacuum sputtering cathode has a hollow structure (2) able to rotate about its axis and a magnetic confinement circuit (3) arranged peripherally about said structure. The cathode according to the invention is particularly suitable for the rapid dissipation of the thermal energy given off by the sputtering process and in particular for the sputtering of metals with a low melting point.
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申请公布号 |
US5158660(A) |
申请公布日期 |
1992.10.27 |
申请号 |
US19910712662 |
申请日期 |
1991.06.10 |
申请人 |
SAINT-GOBAIN VITRAGE INTERNATIONAL |
发明人 |
DEVIGNE, ROLAND;BEAUFAYS, JEAN-PIERRE |
分类号 |
C23C14/34;H01J37/34 |
主分类号 |
C23C14/34 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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