| 摘要 |
In the present invention STRESS-FREE CHEMO-MECHANICAL POLISHING AGENT FOR II-VI COMPOUND SEMICONDUCTOR SINGLE CRYSTALS AND METHOD OF POLISHING, a II-VI compound semiconductor single crystal wafer is polished smooth to within 50 angstroms by using a mixture of water, colloidal silica and bleach including sodium hypochlorite applied under time and pressure control to achieve chemo-mechanical polishing. Many such compound crystals are not susceptible to polishing by prior art methods.
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