| 摘要 |
PURPOSE:To enhance sensitivity, remaining film endurance, resolution, and dimension controllability by incorporating an alkali-soluble phenol resin and a mixture of the esters of a specified phenolic compound as a photosensitive agent. CONSTITUTION:The ester of quinonediazido-sulfonic acid and the hydroxyl group of the phenol compound represented by formula I and the esters of its hydroxyl groups and sulfonic acid and/or carboxylic acid each represented by formulae II and III, and the alkali-soluble phenol resin are incorporated as the photosensitive material. In formulae I-III, each of R<1>-R<6> is H, halogen, OH, 1-4 C alkyl, or the like; each of R<7> and R<8> is H, halogen, or 1-4 C alkyl; each of R<1>-R<11> is H or 1-4 C alkyl; and each of R<12> and R<13> is optionally substituted alkyl or such aryl. |
