发明名称 POSITIVE TYPE RESIST COMPOSITION
摘要 PURPOSE:To enhance sensitivity, remaining film endurance, resolution, and dimension controllability by incorporating a mixture of the esters between the hydroxides of a specified phenol compound and quinonediazidosulfonic acid and between these hydroxides and sulfonic acid and/or carboxylic acids as a photosensitive agent. CONSTITUTION:An alkali-soluble phenol resin, and a mixture of the hydroxyl groups of one of the phenol compounds represented by formulae I esterified by the quinonediazido sulfonic acid and those esterified by sulfonic acid represented by formula II: -OSO2R<9> and/or esterified by carboxylic acid represented by formula III: -OCOR<10> are incorporated as the photosensitive agent. In formulae I-III, A is optionally substituted alkylene, or the like; (n) is 0 or 1; each of R<1>-R<8> is H, halogen, OH, 1-4C alkyl, or the like; and each of R<9> and R<10> is optionally substituted alkyl or the like.
申请公布号 JPH04301851(A) 申请公布日期 1992.10.26
申请号 JP19910091604 申请日期 1991.03.29
申请人 NIPPON ZEON CO LTD 发明人 KAWADA MASAJI;KASHIWAGI MIKIFUMI;KOITO KAZUKO
分类号 G03F7/022;H01L21/027;H01L21/30 主分类号 G03F7/022
代理机构 代理人
主权项
地址