| 摘要 |
PURPOSE:To enhance the bond properties of an uppermost layer onto an SOG film within a three-layer resist structure using an intermediate layer. CONSTITUTION:After the formation of an SOG film 3 on a lower layer resist 2, the SOG film 3 is bleached in alkali water solution 4 to form a modified layer 5 and then the alkali water solution 4 on the SOG film 3 is cleaned up to form an upper resist 6. |
