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发明名称
HEAT TREATMENT OF SEMICONDUCTOR SUBSTRATE
摘要
申请公布号
JPH04302418(A)
申请公布日期
1992.10.26
申请号
JP19910091429
申请日期
1991.03.29
申请人
NEC CORP
发明人
TOMIYAMA TOMOHIKO
分类号
C30B33/02;H01L21/22;H01L21/31
主分类号
C30B33/02
代理机构
代理人
主权项
地址
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