MASK LAYOUT METHOD FOR SEMICONDUCTOR INTEGRATED CIRCUIT

摘要

PURPOSE:To efficiently design a new mask layout on the basis of a mask layout designed in the past by a manual operation. CONSTITUTION:Standard cell information (c) is extracted from an old graphic pattern (f) designed in the past by a manual operation. A netlist (b) is formed from the old graphic pattern (f) by utilizing an existing netlist verification device 30. The netlist (b) which has been format-converted and the standard cell information (c) are given to an existing automatic arrangement and interconnection device 20; in addition, a new design rule (d) is set. When the new design rule (d) is applied to the old graphic pattern (f), a new graphic pattern (g) can be obtained.