| 摘要 |
<p>PURPOSE:To provide an electrostatic chuck which can follow up temperature change in a wide range, holds a necessary attraction force and shorten a necessary responsive time for attraction and its cancellation of a wafer. CONSTITUTION:A film electrode 5 is formed on a main face 2a of a ceramic base body 2. A ceramics dielectric layer 4 is formed in such a way to cover the film electrode 5. Temperature of a wafer attraction surface 6 is detected by a temperature detector 9. An electric signal from the temperature detector 9 is sent to an electrostatic chuck control part. Thereby, the most suitable voltage value in accordance with the temperature of the wafer attraction surface is computed and an electric power source part for the chuck is controlled in accordance with an electric signal from the electrostatic chuck control part.</p> |
